Evaluation of tin nitride (Sn3N4) via atomic layer deposition using novel volatile Sn precursors

Dalton Trans., 2023, Advance Article
DOI: 10.1039/D3DT02138F, Paper
Hyeonbin Park, Heenang Choi, Sunyoung Shin, Bo Keun Park, Kibum Kang, Ji Yeon Ryu, Taeyong Eom, Taek-Mo Chung
Novel tin precursor with iminopyrrolidine moieties was synthesized and investigated for Sn3N4 thin films via the ALD process.
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